Spc, Process-chemistry relationships, Thin film deposition, CVD Diffusion, AFM, Film characterization, Plasma vacuum systems, Doe, sims, TEM, Sem, Xps

statistical data analysis , Doe, polarized illumination, low k1 imaging, Optics, photolithography process development, Spc, immersion lithography, material characterization, lithography simulation tools

overlay , defect mechanisms, process windows, exposure control, lithography fundamentals, SPC troubleshooting, Alignment, DNS SVG track, root-cause analysis, Canon Stepper EVG620, process monitoring