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Job Summary
Lead process development, optimization, and transfer to manufacturing to achieve yield, quality, cost, and reliability targets.
Key Responsibilities
Own and drive advanced process modules (thin film deposition - metal/passivation, wafer thinning, thermal - oxidation, diffusion, implantation).
Lead yield improvement and defect reduction initiatives using statistical and DOE methodologies.
Drive new process integration (NPI) and process transfer to high-volume manufacturing.
Perform root cause analysis and implement robust corrective/preventive actions.
Define process control plans, SPC strategies, and OCAP execution.
Collaborate cross-functionally with equipment, integration, quality, and R&D teams.
Mentor junior engineers and technicians.
Interface with suppliers on process and material improvements.
Qualifications
Bachelor's or Master's degree in Engineering (Electrical, Chemical, Materials, or related).
At least 5 years of semiconductor wafer fab process experience in thin film deposition - metal/passivation and/or thermal - oxidation, diffusion, implantation.
Strong knowledge of SPC, DOE, FMEA, and statistical data analysis tools.
Demonstrated leadership in cross-functional technical projects.
Strong analytical, problem-solving, and communication skills
Preferred
PhD in Engineering (Electrical, Chemical, Materials, or related).
Six Sigma certification (Green/Black Belt).
Experience supporting 4 to 6 wafer scaling or equivalent manufacturing transition.
Job ID: 151685479
Skills:
thermal oxidation , diffusion, thin film deposition, Fmea, wafer thinning, process control plans, OCAP execution, SPC strategies, metal passivation, implantation, statistical data analysis tools, DOE methodologies
Skills:
process qualification , Statistical Analysis, ocap, Root Cause Analysis, 5 Why, Overlay accuracy, Process Recipes, Control Plans, Exposure dose and focus, 8D, Mask Layout and reticle design, Lift-off lithography processes, photolithography, Eco, Fishbone, FMEA methodologies, Photoresist coating, Pfmea, Pattern fidelity and defectivity, Etch processes, Broadband i-line DUV 193 nm aligner stepper scanner platforms